Description

Reflecting objectives are renowned for their unique optical properties. Beck Optronic Solutions is one of very few companies worldwide designing and manufacturing them. Originally designed for microscopy in 1904, they are based upon a two-mirror system. The all-reflecting optics mean that, in contrast to refracting objectives, they are totally free from chromatic aberrations. By careful selection of the mirror curvatures and their separation, they are corrected for spherical aberration, coma, and astigmatism, leading to diffraction limited imaging performance. In addition to these corrections, reflecting objectives have the following advantages when compared to standard refracting microscope objectives:

• Longer working distances relative to the magnification;

• Large numerical apertures for improved light gathering power;

• High throughput from UV to far infrared;

• Coatings available to enhance performance at specific wavelength regions.

Applications include conventional microscopy and

beam delivery systems. With their unique lack of

chromatic aberrations, they excel especially where a

dual wavelength operation is required, such as

alignment to a visible beam for working with an IR or

UV beam laser. Other uses include:

• FT-IR spectroscopy;

• UV metrology and microscopy;

• Semiconductor wafer inspection;

• Photomicroscopy;

• Photolithography;

• Thin film measurements;

• Laser beam delivery systems;

• Laser drilling and etching;

• Product marking;

• Laser pumping;

• Thermal imaging microscopy.